Cytek

DYNATECH WAFER TAPE LAMINATION SYSTEM

This equipment is designed to laminate wafer B/G protective tape to the wafer pattern surface in order to protect wafer circuit from wafer breakage during back-grinding process.

Features:

 

· Capable of Bumping wafer by special bond roller

· 8-12 inch wafer capability

· Precision edge cutting for optimum wafer back-grinding

· High accuracy lamination by pre-aligner

· Air bubble free lamination

· No tape burr and tail after lamination

· Adjustable cutting blade angle

· Adjustable cutting force tension

· Special air blow & suction cleaner for particle free lamination

· Minimum tape consumption

· Easy tape setting by one touch locker

· High precise robotic handler

· Compact design suitable for small space

· Quick and easy conversion for different size wafer

Text Box: © Copyright 2008 Cytek Solutions, Inc.

We are Metrology. We are Microscope.

Applicable wafer size

8 & 12 inch

Applicable frame size

8 & 12 inch

Applicable tape

Normal and UV tape

Control method

PLC control

Display method

GP touch screen

UPH

8 inch(V type)/65 sheets

8 inch(Flat type)/60 sheets

12 inch(Flat type)/45 sheets

Alignment accuracy

+/-0.5 mm, +/-0.5 degree

Wafer cassette

Dual loading

Chuck heat control

Up to 70˚C

Color

Ivory

ESD control

Controlled below 100V from 1000V within 10 seconds

Blade cycle time

Min 500 cut/blade

Cutter blade heat control

0~150˚C

Dimension of machine

1500(d) x 1320(w) x 1750(h) mm

Weight of machine

650 Kgs

Electric power

AC110/220VAC, Single phase, 50/60Hz

Air supply

5~6kgs/cm²

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Host communication(GEM,SECS I,II,HSMS)